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Semiconductors & electronics-fs-laser application

Semiconductor & Electronics Micromachining

The semiconductor industry represents the pinnacle of modern manufacturing, demanding absolute precision, consistency, and material versatility. Traditional machining methods often fail to meet the stringent requirements of high-end components due to thermal distortion and precision limits.Femtosecond laser technology opens a new path for advanced semiconductor manufacturing. 

Gas Distribution Plate (Showerhead) Drilling

The Gas Distribution Plate (Showerhead) is critical in Etching and Deposition (CVD/PVD) equipment. Its micro-hole quality directly dictates wafer process uniformity,requiring thousands of flaw-free micro-holes on a single plate.
Our Technological Breakthroughs:
Ultra-Fine Holes: Capable of drilling vertical micro-holes as small as 20μm.
Extreme Precision: Achieves ±1μm hole diameter accuracy with superior consistency across high-volume arrays.
Thin-Wall Integrity: Maintains structural integrity even with 15μm wall thickness, ensuring no merged or broken holes.
Material Versatility: Perfectly suited for metals (Aluminum, Stainless Steel) and hard-brittle materials like Silicon Carbide (SiC), Ceramics, and Silicon, eliminating chipping issues.

Semiconductor Testing & Probe Cards

In semiconductor testing, Beryllium Copper (BeCu) is widely used for probe cards and lead frames. Traditional stamping or long-pulse lasers often cause warping, compromising test stability.
Femtosecond Laser Cutting Advantages:
Stress-Free Cutting: "Cold ablation" prevents thermal warping, ensuring absolute flatness for stable probe-to-pad contact.
Edge Quality: Delivers smooth, burr-free, and slag-free edges, preserving the mechanical and electrical properties of BeCu.
Micron-Level Control: Dimensional accuracy is maintained within 2μm, meeting the needs of high-density probe arrays.

More Electronics Applications

Precision cutting of complex characters and patterns with ultra-fine linewidths and no deformation.
Cutting of Interdigitated Electrodes (IDEs) and micro-structuring of Wire Bonding Capillaries.
Blind hole drilling in Copper Clad Laminates (CCL) and carbonization-free cutting of conductive cloth.

Why Femtosecond Laser?

Femtosecond laser technology is the future of semiconductor precision manufacturing.
One-Step Manufacturing: Eliminates the need for deburring or post-cleaning, significantly shortening R&D and production cycles.
Non-Destructive: Minimal Heat Affected Zone (HAZ) prevents recast layers and micro-cracks, preserving intrinsic material properties.
Flexible Production: Enables rapid customization through software control. Ideal for high-mix, low-volume production and fast response to iterating chip designs.

Application Examples

BeCu cutting fs-laser

BeCu cutting | Precision 土1μm; Burr-free, Crater-free.

BeCu Cutting

BeCu Cutting | Thickness 0.1mm, Minimum Width 30μm±1μm

BeCu Probe cutting

BeCu Probes | Accuracy Tolerance ≤5μm, Highly Vertical Sidewalls

Blind hole drilling in Copper Clad Laminates (CCL)

CCL Blind Hole Drilling | Aspect Ratio 1:1, Bottom Surface Roughness <Ra0.4μm

carbonization-free cutting of conductive cloth

Conductive Fiber Cloth Cutting | Smooth Cut Edge, Burr-Free, No Broken Threads

Ceramics drilling by fs-laser

Ceramics drilling: Hole Diameter 0.5mm, Tolerance ±2μm, No Burring

Ceramics drilling by mono fs-laser

Ceramic Square Hole Drilling | Hole Dimension: 0.26mm × 0.32mm, Tolerance: ±2μm

Electrodes cutting

Interdigitated Electrode Cutting | Tolerance: ±2μm, Minimum Width: 50μm

Ceramics microhole drilling by fs-laser

Zirconia Drilling | Tolerance ±2μm, Chipping-Free

Cutting of Interdigitated Electrodes

Molybdenum Electrode Cutting | Minimum Width: 0.196mm, Tolerance: ±2μm

Electrodes etching fs-laser

Curved Surface Electrode Pattern Etching | Depth: 0.4-1μm, Substrate Undamaged

fs-laser cutting  conductive cloth

Conductive Fiber Cloth Cutting | Smooth Cut Edge, Burr-Free

Interdigitated Electrodes  (IDEs) cutting

Metal Interdigitated Electrodes (IDEs) cutting | Width: 50μm

Micro-Electronics cutting

Molybdenum Electrode Precision Cutting | Ultra-Microstructure, No Deformation,

Precision Masks cutting fs-laser

Stainless Steel Mask Pattern Cutting | Minimum Width: 92μm±2μm

Probe cutting fs-laser

Probe Tip Etching | Tip Diameter: 0.01mm, Ra0.2μm

Showerhead micro drilling fs-laser

Showerhead micro drilling | Tolerance: ±2μm

SiC etching fs-laser

SiC Gear Spiral Groove Etching | Roughness Ra0.2μm, High Consistency

SiC gear etching fs-laser

Silicon Nitride Etching | Chipping-Free, Controllable Depth

Silicon Nitride Straight Square & Round Hole Drilling

Probe Card Plate Drilling | Square Hole 25μm × 31μm, Tolerance: ±2μm, R<4μm

Tungsten-Potassium Alloy Cutting

Tungsten-Potassium Alloy Cutting:0.05mm Thick,No Deformation, No Recast Layer

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End-to-End Services

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Contact information

Address

F1-F2, Building 4, Jianfa-Xinmei Industrial Park, No. 21 Gongtang Road, Guangming District, Shenzhen, China.

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