ML-NEBULA: Femtosecond Laser Nanostructure Multi-Beam R&D Equipment

Every scientific breakthrough stems from the challenge of limits. In the world of microns, submicrons and even nanometers, the precision of tools defines the depth of exploration. MONO helps every scientist and engineer stay ahead in research, using the most advanced femtosecond laser micromachining technology to accurately turn your ideas into reality.

ML-NEBULA is a femtosecond laser nanostructure multidimensional R&D equipment specially designed for multi-functional and high-precision R&D. It is an ideal choice for scientific laboratories and R&D centers that need to switch between various tasks and pursue extreme precision and flexible solutions. The equipment provides nanoscale micromachining capabilities, from surface treatment to internal direct writing, from prototype production to small-batch production, all can be completed with one machine.

❑ Functional Surface Micro-Nano Structure Fabrication

❑ Optical Waveguide Direct Writing Processing

❑ Microfluidic Chip Fabrication

❑ Nanoscale Linewidth Grating Lithography

❑ Slit Diaphragm/Aperture Diaphragm Processing

Products Features

Support multi-optical path and multi-focus composite processing;
Multi-dimensional beam shaping and control functions;
24/7 beam directivity and quality detection;
Excellent mechanical and thermal stable equipment base;
Processing precision covering nano, sub-micron and micron scales;
Nanojoule-level pulse energy precise control system;
Nanoscale positioning accuracy;
Multi-axis linkage precision processing.

Products Highlights

Functional Surface Micro-Nano Structure Preparation

❑ Used to develop surface micro-nano structures with special optical (such as metalenses, polarization control), mechanical (such as superhydrophobic, self-cleaning), and electrical (such as flexible electrodes, sensors) properties. It supports cutting-edge research in fields like materials science and interface engineering.

Optical Waveguide Direct Writing: Microfluidic Chip Manufacturing

❑ Creates 3D optical path structures inside transparent materials like glass and crystals. Suitable for R&D of photonic integrated chips and optical fiber sensors, as well as precision processing of microchannels, mixers and reaction chambers in microfluidic systems.

Nanoscale Line Width Grating Writing

❑ Develops next-generation optical instruments (such as spectrometers, grating sensors) and information storage devices (such as nanoscale storage units). Realizes high-precision writing of nanoscale line width gratings, breaking through the resolution limit of traditional processing technologies.

High-Precision Slit/Diaphragm Processing

❑ Provides high-precision slit and diaphragm components for optical systems (such as lithography machines, microscopes) and precision instruments (such as particle detectors), ensuring the performance stability and precision consistency of optical devices.

Technical specifications

Item	Details
Laser	Femtosecond Laser (1030/515/343nm)
Processing Area	500mm×500mm	30mm×30mm
Positioning Accuracy (X/Y/Z)	<±0.3um/<±0.3um/<±1um	<±0.15um/<±0.15um/<±0.5um
Processable Material Types	Planar, cylindrical, spherical, 3D curved surfaces, etc., customizable combination
Processing Contents	Depth-controlled etching, carbon-free cutting, through-hole drilling, nanomanufacturing, etc., customizable combination
Minimum Hole Diameter	≥500nm ，customizable as required
Minimum Processable Line Width	≥300nm，customizable as required
Processable Hole Diameter Range	≥200nm，customizable as required
Hole Diameter Precision	≥±50nm ，customizable as required